JPH0445818B2 - - Google Patents

Info

Publication number
JPH0445818B2
JPH0445818B2 JP19085785A JP19085785A JPH0445818B2 JP H0445818 B2 JPH0445818 B2 JP H0445818B2 JP 19085785 A JP19085785 A JP 19085785A JP 19085785 A JP19085785 A JP 19085785A JP H0445818 B2 JPH0445818 B2 JP H0445818B2
Authority
JP
Japan
Prior art keywords
layer
silicone rubber
weight
group
photosensitive
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP19085785A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6250760A (ja
Inventor
Toshihiko Hiruma
Hiroshi Takahashi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujifilm Holdings Corp
Original Assignee
Fuji Photo Film Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fuji Photo Film Co Ltd filed Critical Fuji Photo Film Co Ltd
Priority to JP19085785A priority Critical patent/JPS6250760A/ja
Publication of JPS6250760A publication Critical patent/JPS6250760A/ja
Publication of JPH0445818B2 publication Critical patent/JPH0445818B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/075—Silicon-containing compounds
    • G03F7/0752—Silicon-containing compounds in non photosensitive layers or as additives, e.g. for dry lithography

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Printing Plates And Materials Therefor (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
JP19085785A 1985-08-29 1985-08-29 湿し水不要感光性平版印刷版 Granted JPS6250760A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP19085785A JPS6250760A (ja) 1985-08-29 1985-08-29 湿し水不要感光性平版印刷版

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP19085785A JPS6250760A (ja) 1985-08-29 1985-08-29 湿し水不要感光性平版印刷版

Publications (2)

Publication Number Publication Date
JPS6250760A JPS6250760A (ja) 1987-03-05
JPH0445818B2 true JPH0445818B2 (en]) 1992-07-28

Family

ID=16264925

Family Applications (1)

Application Number Title Priority Date Filing Date
JP19085785A Granted JPS6250760A (ja) 1985-08-29 1985-08-29 湿し水不要感光性平版印刷版

Country Status (1)

Country Link
JP (1) JPS6250760A (en])

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2651687B2 (ja) * 1988-01-22 1997-09-10 コニカ株式会社 湿し水不要平版印刷版材料
JP3290313B2 (ja) 1994-09-07 2002-06-10 富士写真フイルム株式会社 湿し水不要感光性平版印刷版及びその製版方法
US6558873B1 (en) 1999-10-05 2003-05-06 Fuji Photo Film Co., Ltd. Lithographic printing plate precursor
JP4843162B2 (ja) * 2001-08-01 2011-12-21 株式会社アルテコ ２−シアノアクリレート系瞬間接着剤用水性プライマー
JP4843161B2 (ja) * 2001-08-01 2011-12-21 株式会社アルテコ ２−シアノアクリレート系瞬間接着剤用プライマー

Also Published As

Publication number Publication date
JPS6250760A (ja) 1987-03-05

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Legal Events

Date Code Title Description
LAPS Cancellation because of no payment of annual fees